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반도체 / 13-2-4 : SF6 / Cl2 혼합비에 따른 실리콘 식각 특성 고찰

이상균, 강승열, 권광호, 이진호, 조경익, 이형종

A Study on the Silicon Etching Characteristics in ECR using SF6 / Cl2 Gas Mixtures

Sang Kyun Lee, Seung Youl Kang, Kwang Ho Kwon, Jin Ho Lee, Kyoung Ik Cho, Hyung Jong Lee
J Electr Electron Mater 2000;13(2):114-119.
Published online: February 1, 2000
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A Study on the Silicon Etching Characteristics in ECR using SF6 / Cl2 Gas Mixtures
J Electr Electron Mater. 2000;13(2):114-119.   Published online February 1, 2000
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A Study on the Silicon Etching Characteristics in ECR using SF6 / Cl2 Gas Mixtures
J Electr Electron Mater. 2000;13(2):114-119.   Published online February 1, 2000
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