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"Two-step process"

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"Two-step process"

Effect of the Sulfurization Temperature and Annealing Time of E-Beam Evaporated Sn Precursors on the Growth of SnSx Thin Films
Tingjian Huang, Jeha Kim
J Electr Electron Mater 2017;30(11):734-739.   Published online November 1, 2017
We prepared SnSx thin films on both soda-lime glass (SLG) and molybdenum(Mo)/SLG substrates by a two-step process using a Sn precursor followed by sulfur reaction in rapid thermal annealing (RTA) at different sulfurization temperatures (Ts = 200℃, 230℃, 250℃, and 300℃) and annealing times (ts = 10 min and 30 min). The single SnS phase was dominant for 200℃≤Ts<250℃, while an additional phase of SnS2 was appeared at Ts≥250℃ alongside SnS. The SnS grains in all the samples showed strong growth along the preferred [040] direction. The band-gap energy (Eg) of the films was estimated to be 1.24 eV.
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Hydrogen Post-annealing Effect of (Pb0.72 La0.28)Ti0.93O3 Films Fabricated by Pulsed Laser Deposition
Kyoung Bo Han, Chang Hoon Jeon, Hee Sauk Jhon, Sang Yeol Lee
J Electr Electron Mater 2003;16(3):190-194.   Published online March 1, 2003
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