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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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"SSIMT"

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"SSIMT"

Characteristics of the 2-D SSIMT using a CMOS Process
J Korean Inst Electr Electron Mater Eng 2007;20(8):697-700.   Published online August 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.8.697
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Characteristics of the Suppressed Sidewall Injection Magnetotransistor using a CMOS Process
J Korean Inst Electr Electron Mater Eng 2004;17(10):1029-1033.   Published online October 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.10.1029
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