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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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CMOS 공정에 의한 Suppressed Sidewall Injection Magnetotransistor의 특성

송윤귀, 최영식, 김남호, 류지구

Characteristics of the Suppressed Sidewall Injection Magnetotransistor using a CMOS Process

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J Electr Electron Mater 2004;17(10):1029-1033.
Published online: October 1, 2004
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Characteristics of the Suppressed Sidewall Injection Magnetotransistor using a CMOS Process
J Electr Electron Mater. 2004;17(10):1029-1033.   Published online October 1, 2004
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
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Characteristics of the Suppressed Sidewall Injection Magnetotransistor using a CMOS Process
J Electr Electron Mater. 2004;17(10):1029-1033.   Published online October 1, 2004
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