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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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"SOHOS"

Analysis of Fin-Type SOHOS Flash Memory using Hafnium Oxide as Trapping Layer
Jeong Gyu Park, Jae Sub Oh, Seung Dong Yang, Kwang Seok Jeong, Yu Mi Kim, Ho Jin Yun, In Shik Han, Hi Deok Lee, Ga Won Lee
J Korean Inst Electr Electron Mater Eng 2010;23(6):449-453.   Published online June 1, 2010
DOI: https://doi.org/10.4313/JKEM.2010.23.6.449
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