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"Potentiodynamic polarization"

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"Potentiodynamic polarization"

Improvement of Chemical Mechanical Polishing (CMP) Performance of Nickel by Additions of Abrasive and Various Oxidizers
J Korean Inst Electr Electron Mater Eng 2005;18(7):605-609.   Published online July 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.7.605
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Electrochemical Polarization Characteristics and Effect of the CMP Performances of Tungsten and Titanium Film by H2O2 Oxidizer
J Korean Inst Electr Electron Mater Eng 2005;18(6):515-520.   Published online June 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.6.515
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Electrochemical Corrosion and Chemical Mechanical Polishing(CMP) Characteristics of Tungsten Film using Mixed Oxidizer
J Korean Inst Electr Electron Mater Eng 2005;18(4):303-308.   Published online April 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.4.303
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