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Photoresist mask removing
WHERE t1.sid in(parameter_dbtbl_keyword '%Photoresist mask removing%') and t1.xml_status <> 99
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HF cleaning (1)
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Tae Kyung Ha (1)
Gwan Ha Kim (1)
Chang Il Kim (1)
Jong Chang Woo (1)
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"Photoresist mask removing"
Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching
Tae Kyung Ha, Jong Chang Woo, Gwan Ha Kim, Chang Il Kim
J Electr Electron Mater
2010;23(5):353-357.
Published online May 1, 2010
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