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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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"PMOSFET"

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"PMOSFET"

Reduction of Barrier Height between Ni-silicide and P+ Source/drain for High Performance PMOSFET
Sun Kyu Kong, Ying Ying Zhang, Kee Young Park, Shi Guang Li, Soon Yen Jung, Hong Sik Shin, Ga Won Lee, Jin Suk Wang, Hi Deok Lee
J Korean Inst Electr Electron Mater Eng 2009;22(6):457-461.   Published online June 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.6.457
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Impact of Post Gate Oxidation Anneal on Negatlve Bias Temperature Instability of Deep Submicron PMOSFETs
Young Min Kim
J Korean Inst Electr Electron Mater Eng 2003;16(3):181-185.   Published online March 1, 2003
DOI: https://doi.org/10.4313/JKEM.2003.16.3.181
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