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Oxidizer
WHERE t1.sid in(parameter_dbtbl_keyword '%Oxidizer%') and t1.xml_status <> 99
5
results for
"Oxidizer"
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Keywords
Chemical Mechanical Polishing (4)
Oxidizer (4)
CMP (3)
Removal rate (3)
Potentiodynamic polarization (2)
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Publication year
2005 (3)
2004 (1)
2003 (1)
Authors
Sang Yong Kim (2)
U Seon Lee (2)
Yong Jin Seo (2)
Chang Jun Park (1)
Keywords
Chemical Mechanical Polishing (4)
Oxidizer (4)
CMP (3)
Removal rate (3)
Potentiodynamic polarization (2)
Slurry (2)
Abrasive (1)
Catalyst (1)
CMP (chemical mechanical polishing) (1)
Electrochemical corrosion (1)
Mixed oxidizer (1)
Nickel (1)
Non-uniformity (1)
NU (1)
RR (1)
Selectivity (1)
Tungsten (1)
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authors
Sang Yong Kim (2)
U Seon Lee (2)
Yong Jin Seo (2)
Chang Jun Park (1)
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Publication Year
2005 (3)
2004 (1)
2003 (1)
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"Oxidizer"
A Study on Oxidizer Effects in Tungsten CMP
J Electr Electron Mater
2005;18(9):787-792.
Published online September 1, 2005
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Improvement of Chemical Mechanical Polishing (CMP) Performance of Nickel by Additions of Abrasive and Various Oxidizers
J Electr Electron Mater
2005;18(7):605-609.
Published online July 1, 2005
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Electrochemical Corrosion and Chemical Mechanical Polishing(CMP) Characteristics of Tungsten Film using Mixed Oxidizer
J Electr Electron Mater
2005;18(4):303-308.
Published online April 1, 2005
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Role of Oxidants for Metal CMP Applications
Yong Jin Seo, Sang Yong Kim, U Seon Lee
J Electr Electron Mater
2004;17(4):378-383.
Published online April 1, 2004
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Effects of Mixed Oxidizer on the W-CMP Characteristics
Chang Jun Park, Yong Jin Seo, Sang Yong Kim, U Seon Lee
J Electr Electron Mater
2003;16(12s):1181-1186.
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