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"Oxidizer"

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"Oxidizer"

A Study on Oxidizer Effects in Tungsten CMP
J Korean Inst Electr Electron Mater Eng 2005;18(9):787-792.   Published online September 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.9.787

Citations

Citations to this article as recorded by  
  • Effect of Oxidizer on the Polishing in Cadmium Telluride CMP
    Byeong Cheol Shin, Chang Suk Lee, Hae Do Jeong
    Journal of the Korean Society for Precision Engineering.2015; 32(1): 69.     CrossRef
  • 193 View
  • 0 Download
  • 1 Crossref
Improvement of Chemical Mechanical Polishing (CMP) Performance of Nickel by Additions of Abrasive and Various Oxidizers
J Korean Inst Electr Electron Mater Eng 2005;18(7):605-609.   Published online July 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.7.605
  • 140 View
  • 0 Download
Electrochemical Corrosion and Chemical Mechanical Polishing(CMP) Characteristics of Tungsten Film using Mixed Oxidizer
J Korean Inst Electr Electron Mater Eng 2005;18(4):303-308.   Published online April 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.4.303
  • 156 View
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Role of Oxidants for Metal CMP Applications
Yong Jin Seo, Sang Yong Kim, U Seon Lee
J Korean Inst Electr Electron Mater Eng 2004;17(4):378-383.   Published online April 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.4.378
  • 130 View
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Effects of Mixed Oxidizer on the W-CMP Characteristics
Chang Jun Park, Yong Jin Seo, Sang Yong Kim, U Seon Lee
J Korean Inst Electr Electron Mater Eng 2003;16(12s):1181-1186.
DOI: https://doi.org/10.4313/JKEM.2003.16.12s.1181
  • 145 View
  • 0 Download
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