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Ni-silicide
WHERE t1.sid in(parameter_dbtbl_keyword '%Ni-silicide%') and t1.xml_status <> 99
2
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"Ni-silicide"
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Ni-Silicide (2)
Barrier height (1)
CMOS technology (1)
High performance PMOSFET (1)
Pd stacked structure (1)
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Publication year
2009 (1)
2003 (1)
Authors
Hi Deok Lee (2)
Jin Suk Wang (2)
Soon Eui Ahn (1)
Mi Suk Bae (1)
Hee Hwan Ji (1)
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Keywords
Ni-Silicide (2)
Barrier height (1)
CMOS technology (1)
High performance PMOSFET (1)
Pd stacked structure (1)
Surface damage (1)
TIN-Capping (1)
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Hi Deok Lee (2)
Jin Suk Wang (2)
Soon Eui Ahn (1)
Mi Suk Bae (1)
Hee Hwan Ji (1)
Soon Yen Jung (1)
Sun Kyu Kong (1)
Hun Jin Lee (1)
Ga Won Lee (1)
Shi Guang Li (1)
Soon Young Oh (1)
Kee Young Park (1)
Hong Sik Shin (1)
Ying Ying Zhang (1)
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2003 (1)
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"Ni-silicide"
Reduction of Barrier Height between Ni-silicide and P+ Source/drain for High Performance PMOSFET
Sun Kyu Kong, Ying Ying Zhang, Kee Young Park, Shi Guang Li, Soon Yen Jung, Hong Sik Shin, Ga Won Lee, Jin Suk Wang, Hi Deok Lee
J Korean Inst Electr Electron Mater Eng
2009;22(6):457-461.
Published online June 1, 2009
DOI:
https://doi.org/10.4313/JKEM.2009.22.6.457
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The Dependency of Surface Damage to NiSi for CMOS Technology
Hee Hwan Ji, Soon Eui Ahn, Mi Suk Bae, Hun Jin Lee, Soon Young Oh, Hi Deok Lee, Jin Suk Wang
J Korean Inst Electr Electron Mater Eng
2003;16(4):280-285.
Published online April 1, 2003
DOI:
https://doi.org/10.4313/JKEM.2003.16.4.280
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