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"Mismatching"

Analysis of Matching Characteristics of MIM Capacitors with Al2O3/HfO2/Al2O3
Jae Hyung Jang, Hyuk Min Kwon, Yi Jung Jung, Ho Young Kwak, Sung Gyu Kwon, Hwan Hee Lee, Sungyong Go, Weon Mook Lee, Song Jae Lee, Hi Deok Lee
J Electr Electron Mater 2012;25(1):1-5.   Published online January 1, 2012
In this paper, matching characteristic of MIM (metal-insulator-metal) capacitor with Al2O3/HfO2/Al2O3 (AHA) structure is analyzed. The floating gate capacitance measurement technique (FGMT) was used for analysis of matching characteristic of the MIM capacitors in depth. It was shown that matching coefficient of AHA MIM capacitor is 0.331%㎛ which is appropriate for application to analog/RF integrated circuits. It was also shown that the matching coefficient has a more strong dependence on the width than length of MIM capacitor.
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