Indium-doped Mg_0.05Zn_0.95O thin films were deposited on glass substrates by a sol-gel method. Three types of indium precursors such as indium chloride, indium acetate, and indium nitrate were used as doping sources. Physical properties of fabricated thin films were analyzed through XRD (x-ray diffraction), UV-vis spectrophotometer, Hall effect measurement, and EDS (energy dispersive x-ray spectroscopy). All In-doped thin films grown in this study exhibited a preferred orientation of (002) with over 80% transmittance. The results showed that the Mg_0.05Zn_0.95O thin film from indium chloride as the indium precursor has higher crystallinity and transmittance with lower resistivity when compared with those from other indium precursors.

In this study, Mg_xZn_1-xO thin films, which can be applied not only to active layers of light-emitting devices (LEDs), such as UV-LEDs, but also to solar cells, high mobility field-effect transistors, and power semiconductor devices, are fabricated using the sol-gel method. ZnO and Mg_0.3Zn_0.7O solution synthesized by the sol-gel method and the thin film were grown by spin coating on a Si (100) substrate and sapphire substrate. The solutions are synthesized by dissolving precursor materials in 2-methoxyethanol (2-ME) solvent, and then monoethanolamine (MEA) was added to the mixed solution as a sol stabilizer. Zinc acetate dihydrate is used as a ZnO precursor, while Mg nitrate hexahydrate and Mg acetate tetrahydrate are used as an MgO precursor. Then, the optical and structural characteristics of the fabricated thin films are compared. The molar concentration of the Zn precursor in the solvent is fixed at 0.3 M, and the amount of the Mg precursor is 30% of Mg²⁺/Zn²⁺. The optical characteristics are measured using an UV-vis spectrophotometer, and the transmittance of each wavelength is measured. Structural characteristics are measured using X-ray diffraction (XRD) and transmission electron microscopy (TEM). Composition analyses are performed using energy dispersive X-ray spectroscopy (EDS). The Mg_0.3Zn_0.7O thin film was well formed at the ratio of the Mg precursor added regardless of the type of Mg precursor, and the c-axis of the thin film was decreased, while the band gap was increased to 3.56 eV.

The phase evolution, microstructure, and microwave dielectric properties of Ba(Mg_0.5-2xY_2xW_0.5-xTi_x)O₃ (x＝ 0.005~0.05) ceramics sintered at 1,700℃ for 1h were investigated. All compositions exhibited a 1:1 ordered cubic perovskite structure. The field emission scanning electron microscopy image revealed a dense microstructure in all the compositions. As the value of x increased, the lattice parameter, dielectric constant, and quality factor increased. The temperature coefficient of resonant frequency changed from -19.6 ppm/℃ to -5.9 ppm/℃ with increasing x value. The dielectric constant, quality factor, and temperature coefficient of resonant frequency of Ba(Mg_0.40Y_0.10W_0.45Ti_0.05)O₃ were 21.7, 132,685 GHz, and -5.9 ppm/℃, respectively.

Mullite (3Al₂O₃·2SiO₂) has emerged as a promising candidate for high-temperature structural materials due to its erosion resistance, chemical and thermal stabilities, relatively low thermal expansion coefficient, excellent thermal shock and creep resistances, and low dielectric constant. However, since the pure mullite sintering temperature is as high as 1,600~1,700℃, there is an increasing need for a sintering additive capable of improving the strength characteristics while lowering the sintering temperature. Herein we have tried to obtain the optimal sintering additive composition by adding MgO, Cr₂O₃, and Y₂O₃ to mullite, followed by sintering at 1,325~1,550℃ for 2 h. With additives of 2 wt% of MgO, 2 wt% of Cr₂O₃, 4 wt% of Y₂O₃, A density of 3.23 g/cm³ was obtained for the sintered body at 1,350℃ upon using 2 wt% MgO, 2 wt% Cr₂O₃, and 4 wt% Y₂O₃ as additives. The three-point flexural strength of that was 275 MPa and the coefficient of thermal expansion (CTE) was 4.15 ppm/℃.

We investigated the phase evolution, microstructure, and microwave dielectric properties of Na- and Zr-doped Ba(Mg_0.5W_0.5)O₃ [i.e., (Ba_1-2xNa_2x)(Mg_0.5-xZr_xW_0.5)O₃] ceramics. BaWO₄ as a secondary phase was observed in all compositions, and it increased as the dopant concentration increased. All specimens revealed a dense microstructure. For the composition of x=0.01, polyhedral grains were observed. As the dopant concentration increased, the densification and the grain growth were promoted by a liquid phase. The quality factor(Q×f₀) decreased remarkably, whereas the dielectric constant (ε_r) tended to decrease as the dopant concentration increased. The dielectric constant, quality factor, and temperature coefficient of the resonant frequency of the composition of x=0.01 sintered at 1,700℃ for 1 h were 18.6, 216,275 GHz, and -22.0 ppm/℃, respectively.

The surface of Mg alloy, AZ31 and AZ91, were treated by PEO (plasma electrolytic oxidation) in Na-P system electrolyte, with different applied voltage and time. Thickness, roughness and X-ray crystallographic analysis revealed several results. The more applied time and voltage of PEO treated, the thicker oxidized surface coating layer were covered. And surface roughness increased with the thickness of oxidized layer. It was thought that when oxide layer grew, resistivity and breakdown voltage increased with the thickness of layer, and then, the energy of micro plasma need to be higher then before. So, it made craters and pores of surface become greater, which were responsible for the coarse surface.

Sintering, microstructure, thermal conductivity and microwave dielectric properties of xLiF-(1-x)MgO ceramics (x=0.03-0.10 mol) were investigated. The high density was obtained in the specimens of x≥0.06, i.e., 0.04 LiF-0.96 MgO in mol, whereas the amount of 0.03 mol LiF was insufficient to densify. From the result that the contact flattening in the sintered specimen was observed, the densification occurred through the liquid-phase sintering. The specimen of x=0.06 showed the highest room-temperature thermal conductivity. Relative density, thermal conductivity, dielectric constant, and quality factor (Q x f) of the specimen for x=0.06 sintered at 900°C for 4 h were 97.8%, 39.2 Wm-1K-1, 9.45, and 14,671 GHz, respectively.

We report the characteristics of thin-film transistor (TFT) to make the bi-channel structure with stacked Mg0.1ZnO0.9O (Mg= 10 at.%) and ZnO. The ZnO and Mg0.1Zn0.9O thin films were deposited by radio frequency (RF) co-sputter system onto the thermally oxidized silicon substrate. A total thickness of active layer was 50 nm. Firstly, the ZnO thin films were deposited to control the thickness from 5 nmto 30 nm. Sequentially, the Mg0.1Zn0.9O thin films were deposited to change from 45 nm to 20 nm. Thebi-layer TFT shows more improved properties than the single layer TFT. The field effect mobility and sub threshold slope for Mg0.1Zn0.9O/ZnO-TFT are 7.40 cm2V-1s-1 and 0.24 V/decade at the ZnO thickness of 10 nm, respectively.

Tubular-shaped ZnO crystals were synthesized by thermal evaporation technique under air atmosphere. Mixture of Zn and Mg powder was used as the source material. The thermal evaporation and oxidation of Zn/Mg mixture were carried out for 1 hr at 1,000℃ and 1,200℃ under in air under atmospheric pressure. When only Zn powder was used as a source material, tetrapod-shaped ZnO crystals were synthesized. This provides that Mg played a key role in the formation of the tubular-shaped crystals. SEM images showed that the tubular-shaped ZnO crystals grew along [0001] direction. XRD spectrum revealed that the ZnO tubes had hexagonal wurtzite structure. Two emission peaks at 380 nm and 510 nm were observed in the room temperature cathodoluminescence spectrum.

This is the study on the development of fusion heat dissipation of carbon magnesium materials. The purpose of this study is for effective utilization of heat emission which is the core of LED lighting. The result of study enabled the derivation of side satisfying result of making the surface temperature of lighting to be below 70℃ (actual measurement: 58℃) using magnesium. The lighting products that use magnesium was made possible based on the result of this study. Also from the performance aspect such as light distribution, the measurement of light efficiency demonstrated the level of 90 lm/W. Therefore the commercialization of lighting was made possible and the efficiency could be further enhanced by supplementation of LED performance.

Concern for the TOS (Transparent Oxide Semiconductor) is increasing with the recent increase in interest for flexible device. Especially MgZnO has attracted a lot of attention. MgxZn1-xO, which ZnO-based wideband-gap alloys is tuneable the band-gap ranges from 3.36 eV to 7.8 eV. In particular, the flexible substrate, the crystal structure of the amorphous as well as the surface morphology is not good. So research of MgZnO thin films growth on flexible substrate is essential. Therefore, in this study, we studied on the effects of the oxygen partial pressure on the structural and crystalline of Mg0.1Zn0.9O thin films. MgZnO thin films were deposited on PES substrate by using pulsed laser deposition. We used XRD and AFM in order to observe the structural characteristics of MgZnO thin films. UV-visible spectrophotometer was used to get the band gap and transmittance. Crystallization was done at a low oxygen partial pressure. The crystallinity of MgZnO thin films with increasing temperature was improved, Grain size and RMS of the films were increased. MgZnO thin films showed high transmittance over 80% in the visible region.

The effect of co-sputtering condition on the structural properties of Mg_xZn_1-xO thin films grown by RF magnetron co-sputtering system was investigated for manufacturing UV LED. Mg_xZn_1-xO thin films were grown with ZnO and MgO target varying RF power. Structural properties were investigated by X-ray diffraction (XRD) and Energy dispersive spectroscopy (EDS). The Mg_xZn_1-xO thin films have sufficient crystallinity on the high ZnO power. The EDS analyzed showed that the Mg content in the Mg_xZn_1-xO films decreased from 3.99 to 24.27 at.% as the RF power of ZnO target increased. The Mg content in the Mg_xZn_1-xO films could be controlled by co-sputtering power.

The effect of co-sputtering condition on the structural properties of MgxZn1-xO thin films grown by RF magnetron co-sputtering system was investigated for manufacturing ZnO/MgZnO structure LED. MgxZn1-xO thin films were grown with ZnO and MgO target varying RF power. Structural properties were investigated by X-ray diffraction (XRD) and Energy dispersive spectroscopy (EDS). The ZnO thin films have sufficient crystallinity on the high RF power. As RF power of ZnO target increased, the contents of MgO in the MgxZn1-xO film decreased. LED was manufactured using ZnO/MgZnO multi-layer on p-GaN/Al2O3 substrate. Threshold voltage of multi-layer LED was appeared at 8 V, and it was luminesced at wave length of 550 nm.

In this work, we study on the effects of the oxygen pressure on the structural and crystalline of MgZnO thin films. MgZnO thin films were deposited on p-Si (111) substrates by using pulsed laser deposition. The X-ray diffraction analysis and energy dispersive X-ray results revealed that as the oxygen pressure increased and Mg content in the MgZnO films decreased. Also Crystal structure was changed from cubic rock salt to hexagonal wurtzite. Alpha step and atomic force microscopy results showed that the thickness of the films are about 100 nm, and it has been found that the MgZnO (002) preferred orientation were deposited with increasing the oxygen pressure. Therefore, the effect of the preferred orientation, the crystallization grew in the form of the columnar; Grain size and RMS of the films were increased with increasing oxygen pressure.

This research shows the electrical characteristic using excellent epoxy nano-composite of MgO 5.0 wt% and SiO2 0.4 wt% in mechanical strength test depending on nano-additive. First of all, volume resistance depending on nano-additive and temperature using high resistance meter (HP. 4329A) by increasing 10, 100, 1,000 V of applying voltage was measured. Moreover, temperature range of 25~120℃ with virgin sample was tested using TO-9B oven by Ando Company. The result showed that virgin and the samples added with MgO and SiO2 had similar value of volume resistance in low temperature and low electric field region and reduced with slow slope. The nano-composite`s volume resistance of sample added with MgO and SiO2 had higher value than virgin sample`s volume resistance in high temperature region more than 80℃. Moreover, the slope has steeply reduced. The volume resistance of sample added with MgO 5.0 wt% was 8.38×10(13) Ω·cm and it was 6.8 times more than virgin sample in high temperature at 120℃. The insulation characteristics were constant although filler has changed in low temperature region. But, in high temperature region, the value of volume resistance of sample with MgO 5.0 wt% was 7.6 times more than the virgin sample`s volume resistance.