The effect of co-sputtering condition on the structural properties of Mg_xZn_1-xO thin films grown by RF magnetron co-sputtering system was investigated for manufacturing UV LED. Mg_xZn_1-xO thin films were grown with ZnO and MgO target varying RF power. Structural properties were investigated by X-ray diffraction (XRD) and Energy dispersive spectroscopy (EDS). The Mg_xZn_1-xO thin films have sufficient crystallinity on the high ZnO power. The EDS analyzed showed that the Mg content in the Mg_xZn_1-xO films decreased from 3.99 to 24.27 at.% as the RF power of ZnO target increased. The Mg content in the Mg_xZn_1-xO films could be controlled by co-sputtering power.
