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"Interface states"

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"Interface states"

Regular Paper : The Effect of Catalytic Metal Work Functions and Interface States on the High Temperature SiC-based Gas Sensors
Ji Chul Jung, Sang Mo Koo
J Korean Inst Electr Electron Mater Eng 2011;24(4):280-284.   Published online April 1, 2011
DOI: https://doi.org/10.4313/JKEM.2011.24.4.280
Silicon carbide (SiC)-based gas sensors can be operated at very high temperatures. So far, catalytic metal-schottky diodes respond fast to a change between a reducing and an oxidizing atmosphere. Therefore SiC diodes have been suggested for high temperature gas sensor applications. In this work, the effect of reactivity of the catalytic surface on the 4H-SiC sensor-structures in 375 K∼775 K have been studied and some fundamental simulations have also been performed.
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C-V Characterization of Plasma Etch-damage Effect on (100) SOI
Yeong Deuk Jo, Ji Hong Kim, Dae Hyung Cho, Byung Moo Moon, Won Ju Cho, Hong Bay Chung, Sang Mo Koo
J Korean Inst Electr Electron Mater Eng 2008;21(8):711-714.   Published online August 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.8.711
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Improvement of Carrier Mobility on Silicon-Germanium on Insulator MOSFET Devices with a Strained-Si Layer
Won Ju Cho, Hyun Mo Koo, Woo Hyun Lee, Sang Mo Koo, Hong Bay Chung
J Korean Inst Electr Electron Mater Eng 2007;20(5):399-402.   Published online May 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.5.399
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Electrical Characterization of MOS (metal-oxide-semiconductor) Capacitors on Plasma Etch-damaged 4H-Silicon Carbide
Nam Gyu Jo, Sang Mo Gu, Yong Deug U, Sang Gwon Lee
J Korean Inst Electr Electron Mater Eng 2004;17(4):373-377.   Published online April 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.4.373
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