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"Index of refraction"

A Study of the Dielectric Characteristics of the Low-k SiOCH Thin Films by Ellipsometry
In Hwan Yi, Chang Su Hwang, Hong Bae Kim
J Korean Inst Electr Electron Mater Eng 2008;21(12):1083-1089.   Published online December 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.12.1083
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