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ICP-RIE
WHERE t1.sid in(parameter_dbtbl_keyword '%ICP-RIE%') and t1.xml_status <> 99
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C4F8 (1)
Dry etching (1)
Etch rate (1)
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SF6 (1)
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2008 (1)
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Soon Il Kwon (1)
Dong Gun Lim (1)
Woo Chang Song (1)
Kea Joon Yang (1)
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Etch rate (1)
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"ICP-RIE"
Improvement of Etch Rate and Profile by SF6, C4F8 and O2 Gas Modulation
Soon Il Kwon, Kea Joon Yang, Woo Chang Song, Dong Gun Lim
J Electr Electron Mater
2008;21(4):305-310.
Published online April 1, 2008
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