Various process modifications have been used to minimize SiO₂ gate oxide aging in metal-oxide-semiconductor field-effect transistors (MOSFETs). In particular, post-metallization annealing (PMA) with a deuterium ambient can effectively eliminate both bulk traps and interface traps in the gate oxide. However, even with the use of PMA, it remains difficult to prevent high levels of radiation-induced gate oxide damage such as total ionizing dose (TID) during long-term missions. In this context, additional low-temperature heat treatment (LTHT) is proposed to recover from radiation-induced damage. Positive traps in the damaged gate oxide can be neutralized using LTHT, thereby prolonging device reliability in harsh radioactive environments.

Oxide YBCO bulk superconductors are manufactured using the melt process. Because seed crystal growth method utilizes a slow-spreading layer-by-layer reaction, a long-term heat treatment is required to manufacture a single-crystal specimen of several cm. In this study, the melt process method was applied to compensate for the shortcomings of the seed crystal growth method. The thickness of the upper and lower pellets of the YBCO bulk was molded to 40 mm, and YBCO superconductor was produced by heat treatment. The measurement results of capture magnetism was in line with the literature. This results in a relationship that the higher the growth of Y211 particle in the YBCO, the higher the superconducting properties. We analyzed the YBCO superconductor, focusing on the Y₂BaCuO₅ particle distribution.

In particular, gas sensors require characteristics such as high speed, sensitivity, and selectivity. In this study, we fabricated a NO_X gas sensor by using a multi-walled carbon nanotube (MWCNT)/zinc oxide (ZnO) composite film. The fabricated MWCNT/ZnO gas sensor was then treated by a 450℃ temperature process to increase its detection sensitivity for NOx gas. We compared the detection characteristics of a ZnO film gas sensor, MWCNT film gas sensor, and the MWCNT/ZnO composited film gas sensor with and without the heat-treatment process. The fabricated gas sensors were used to detect NO_X gas at different concentrations. The gas sensor absorbed NO_X gas molecules, exhibiting increased sensitivity. The sensitivity of the gas sensor was increased by increasing the gas concentration. Additionally, while changing the temperature inside the chamber for the MWCNT/ZnO composite film gas sensor, we obtained its sensitivity for detecting NO_X gas. Compared with ZnO, the MWCNT film gas sensor is excellent for detecting NO_X gas. From the experimental results, we confirmed the enhanced gas sensor sensing mechanism. The increased effect by electronic interaction between the MWCNT and ZnO films contributes to the improved sensor performance.

ZnO thin films were deposited by RF magnetron sputtering and then diffused by using an As source in the ampouletube. Also, the ZnO p-n homojunction was made by using As-doped ZnO thin films, and its properties were analyzed. After the As doping, the surface roughness increased, the crystal quality deteriorated, and the full width at half maximum was increased. The As-doped ZnO thin films showed typical p-type properties, and their resistivity was as low as 2.19×10^-3 Ωcm, probably because of the in-diffusion from an external As source and out-diffusion from the GaAs substrate. Also, the ZnO p-n junction displayed the typical rectification properties of a p-n junction. Therefore, the As diffusion method is effective for obtaining ZnO films with p-type properties.

ZnO:Al thin films were deposited on glass substrate by RF magnetron sputtering followed by in situ heat treatment in the same chamber. Effects of in situ heat treatment on properties of ZnO:Al thin films were investigated in this study. As heat treatment temperature was increased, crystal quality was improved first and then it was deteriorated, surface roughness was decreased, and sheet resistance was also decreased. The decrease in sheet resistance was caused by increasing carrier concentration due to decreased surface roughness. The decrease in surface roughness resulted in increase of transmittance. Therefore, in situ heat treatment is an effective method for obtaining films with better electrical characteristics.

Glass ceramic has a high mechanical strength and low sintering temperature. So, it can beused as a thick film substrate or a high strength insulator. A series of glass ceramic samples based onMgO-Al2O3-SiO2-ZrO2 (MASZ) were prepared by melting at 1,600℃, roll-quenching and heat treatment atvarious temperatures from 900℃ to 1,400℃. Dependent on the heat treatment temperature used, glassceramics with different crystal phases were obtained. Their nucleation behavior, microstructure andmechanical properties were investigated with differential thermal analysis (DTA), X-ray diffraction (XRD),scanning electron microscopy (SEM), and Vicker`s hardness testing machine. With increasing the heattreatment temperature of MASZ samples, their hardness and toughness initially increase and then reachthe maximum points at 1,300℃, and begin to decrease at above this temperature, which is likely to bedue to the softening of glass ceramics. As the content of ZrO2 in MAS glass ceramics increases from 7.0wt.% to 13 wt.%, Vicker`s hardness and fracture toughness increase from 853 Kg/mm2 to 878 Kg/mm2and 1.6 MPa??m1/2 to 2.4 MPa??m1/2 respectively, which seems to be related with the nucleation of elongatedphases like fiber.

CIGS is one of thin film solar cell and has been studied so much, because of the possibility of low price and high efficiency. Until now, co-evaporation and sputtering were typical method to prepare CIGS absorption layer, and a few company commercialized solar cell by these method. However,non-vacuum process which has been studied for long time has not been progressed, though the merit of low price. Especially, aerosol deposition method has not been reported, because it is difficult to prepare a large quantity of various CIGS powder. In this study, CIGS powder was synthesized by mechanochemical method and CIGS absorption layer was deposited by aerosol deposition method. The thickness of the CIGS layer was controlled by the number of deposition and the surface roughness of it was affected by the amount of flow gas. And, also, I-V curve of it appeared metallic property in the case of ‘as deposition’. After heat treatment in Se-rich atmosphere, the electrical property of it changed to a semiconductor. CdS and transparent conduction layer were formed by a typical method on it for solar cell. The efficiency of cell was appeared 0.19%. Though the efficiency was low because of the disharmony in the after-process, it was conformed that CIGS solar cell could be prepared by aerosol deposition.