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HF cleaning
WHERE t1.sid in(parameter_dbtbl_keyword '%HF cleaning%') and t1.xml_status <> 99
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Gwan Ha Kim (1)
Chang Il Kim (1)
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"HF cleaning"
Removal of Photoresist Mask after the Cl2/HBr/CF4 Reactive Ion Silicon Etching
Tae Kyung Ha, Jong Chang Woo, Gwan Ha Kim, Chang Il Kim
J Korean Inst Electr Electron Mater Eng
2010;23(5):353-357.
Published online May 1, 2010
DOI:
https://doi.org/10.4313/JKEM.2010.23.5.353
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