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"Etch rate"

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"Etch rate"

Improvement of Etch Rate and Profile by SF6, C4F8 and O2 Gas Modulation
Soon Il Kwon, Kea Joon Yang, Woo Chang Song, Dong Gun Lim
J Korean Inst Electr Electron Mater Eng 2008;21(4):305-310.   Published online April 1, 2008
DOI: https://doi.org/10.4313/JKEM.2008.21.4.305

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Citations to this article as recorded by  
  • Hydrophobic Properties on RF-sputtered PTFE Films coated on UV-treated Glass Substrates
    Jin Woon Son, Hyon O Youn, Kang Bae, Sun Young Sohn, Hwa Min Kim
    Journal of Korean Institute of Electrical and Electronic Materials Engineers.2010; 23(1): 6.     CrossRef
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Dry Etching of Polysilicon in HBr/O2 Inductively Coupled Plasmas
Seong Jin Beom, O Seong Song, Hye Seong Lee, Jong Jun Kim
J Korean Inst Electr Electron Mater Eng 2004;17(1):1-6.   Published online January 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.1.001

Citations

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  • Parameters and Composition of Plasma in a Mixture of HBr + O2: Model Adjustment and Comparison with Experiment
    M. V. Tsepkin, A. M. Efremov, V. B. Betelin, K.-H. Kwon
    Russian Microelectronics.2026; 55(1): 1.     CrossRef
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Photoelectrochemical etching of GaN using KOH based solution
J Korean Inst Electr Electron Mater Eng 1999;12(4):298-304.   Published online April 1, 1999
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