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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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"CFUBM"

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"CFUBM"

Mechanical Properties of Ti doped Amorphous Carbon Films prepared by CFUBM Sputtering Method
J Korean Inst Electr Electron Mater Eng 2007;20(8):706-710.   Published online August 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.8.706
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Characteristics of Hydrogenated Amorphous Carbon (a-C:H) Thin Films Grown by Close Field UnBalanced Magnetron Sputtering Method
Yong Seob Park, Byeong Yu Hong
J Korean Inst Electr Electron Mater Eng 2004;17(3):278-282.   Published online March 1, 2004
DOI: https://doi.org/10.4313/JKEM.2004.17.3.278
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