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Volume 9(8); September 1996

The Electrical Conduction Characteristics of Polyimide Thin Films Fabricated by Vapor Deposition Polymerization ( VDP ) Method based on PMDA and 4,4'- DDE monomer: Hyeong Gweon Kim, Duck Chool Lee; J Electr Electron Mater 1996;9(8):776-781.

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Near Electromagnetic Field Analysis of HTS Microstrip Patch Antenna: Dong Chul Chung, Won Il Huh, Min Ki Kim, Tae Hee Han, Byung Sung Han; J Electr Electron Mater 1996;9(8):783-788.

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A Study on the Nonvolatile Memory Characteristics of MNOS Structures with Double Nitride Layer: Hyung Ok Lee; J Electr Electron Mater 1996;9(8):789-798.

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A Study on Process Parameter Extraction and Device Characteristics of nMOSFET using DTC Method: Cheol In Lee, Eui Goo Chang; J Electr Electron Mater 1996;9(8):799-805.

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Ⅰ - Ⅴ Characteristics of Ground electrode Fabricated using an Aluminium Scrap: Woo Sun Lee, Yong Ho Chung, Jin Sung Park; J Electr Electron Mater 1996;9(8):806-812.

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The Characteristics of D . C . Switching Threshold Voltage for Amorphous As10Ge15Te75 Thin Film: Byeong Seok Yi, Hyun Yong Lee, Young Jong Lee, Hong Bay Chung; J Electr Electron Mater 1996;9(8):813-818.

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CO Gas Sensitivity of ZnO and ZnO - CuO Thick Films: Seok Taek Jun, U Sung Choi; J Electr Electron Mater 1996;9(8):819-824.

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3- D Underwater Object Restoration Using Ultrasonic Transducer Fabricated with Porous Piezoelectric Resonator and Neural Network: Hyun Chul Cho, Jung Hak Park, Geon Sa Gong; J Electr Electron Mater 1996;9(8):825-830.

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Corrosion characteristics of separator for MCFC: Gwi Yeol Kim; J Electr Electron Mater 1996;9(8):831-835.

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Structural and Ferroelectric Characteristics of Sol - Gel Pb(Zr1-xTix)O3 Thin Films According to the Sintering Conditions and Zr / Ti mol%: Joon Han Kim, Hyun Sang Yoon, Jeong Heum Park, Nak Won Jang, Chang Yub Park; J Electr Electron Mater 1996;9(8):836-849.

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Research Trend of Molten Carbonate Fuel Cell: Gwi Yeol Kim; J Electr Electron Mater 1996;9(8):851-857.

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A Trend of Research for a New Insulating Materials: Don Chan Cho, Yong Woo Lee, Jin Woong Hong; J Electr Electron Mater 1996;9(8):859-866.

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