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반도체 / 자장 강화 반응성 이온 식각 장비를 이용한 몰리브덴 박막의 식각 특성 연구

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A Study on Etching Characteristics of Molybdenum Thin Films by Magnetically Enhanced Reactive Ion Etching System

Nam Hoon Kim, Kwang Ho Kwon, Chang Il Kim, Eui Goo Jang
J Electr Electron Mater 2000;13(1):6-12.
Published online: January 1, 2000
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A Study on Etching Characteristics of Molybdenum Thin Films by Magnetically Enhanced Reactive Ion Etching System
J Electr Electron Mater. 2000;13(1):6-12.   Published online January 1, 2000
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
A Study on Etching Characteristics of Molybdenum Thin Films by Magnetically Enhanced Reactive Ion Etching System
J Electr Electron Mater. 2000;13(1):6-12.   Published online January 1, 2000
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