Two-dimensional materials have shown a great promise for the next-generation electronic materials due to their unique optical, physical, and chemical properties that are distinct from their bulk counterparts. Their atomic-level thickness, the feature for flexible tenability, and exposed huge surface allow various approaches for high-performance nanoscale devices. Especially, this review highlights the recent progress on two-dimensional dielectric nanosheets, which are obtained by cheap and mass-producible solution-based exfoliation process, accompanied by the preparation methods, various deposition methods, and the characteristics of devices using a dielectric nanosheet thin films. We also present a perspective on the advantages offered by this two-dimensional dielectric nanosheets for the upcoming future nanoelectonics.
