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습식 공정법에 의한 고경도 투명 전도막 제조

박종국, 전대우, 이미재, 임태영, 황종희, 김진호

Fabrication of Transparent Conducting Thin Film with High Hardness by Wet Process

Jong Guk Park, Dae Woo Jeon, Mi Jai Lee, Tea Young Lim, Jonghee Hwang, Jin Ho Kim
J Electr Electron Mater 2015;28(12):826-830.
Published online: December 1, 2015
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Transparent Ag nanowire conducting thin films with high surface hardness were fabricated by bar coating method. When coating speed was changed from 35 mm/sec to 50 mm/sec, the transmittance of coated glass increased from 65.3% to 80.8% in visible light range and the surface resistance was changed from 10.1 Ω/sq to 23.3 Ω/sq. The surface hardness and adhesion of thin film were 5H and 5B.

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Fabrication of Transparent Conducting Thin Film with High Hardness by Wet Process
J Electr Electron Mater. 2015;28(12):826-830.   Published online December 1, 2015
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
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Fabrication of Transparent Conducting Thin Film with High Hardness by Wet Process
J Electr Electron Mater. 2015;28(12):826-830.   Published online December 1, 2015
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