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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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CHF3/CF4 를 사용한 콘택 산화막 식각

김창일, 김태형, 장의구

Contact Oxide Etching using CHF3/CF4

Chang Il Kim, Tae Hyung Kim, Eui Goo Chang
J Electr Electron Mater 1995;8(6):774-779.
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Contact Oxide Etching using CHF3/CF4
J Electr Electron Mater. 1995;8(6):774-779.
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Contact Oxide Etching using CHF3/CF4
J Electr Electron Mater. 1995;8(6):774-779.
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