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TCAD 시뮬레이션을 이용한 Fin형 SONOS Flash Memory의 모서리 효과에 관한 연구

양승동, 오재섭, 윤호진, 정광석, 김유미, 이상율, 이희덕, 이가원

A Study on the Corner Effect of Fin-type SONOS Flash Memory Using TCAD Simulation

Seung Dong Yang, Jae Sub Oh, Ho Jin Yun, Kwang Seok Jeong, Yu Mi Kim, Sang Youl Lee, Hee Deok Lee, Ga Won Lee
J Electr Electron Mater 2012;25(2):100-104.
Published online: February 1, 2012
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Fin-type SONOS (silicon-oxide-nitride-oxide-silicon) flash memory has emerged as novel devices having superior controls over short channel effects(SCE) than the conventional SONOS flash memory devices. However despite these advantages, these also exhibit undesirable characteristics such as corner effect. Usually, the corner effect deteriorates the performance by increasing the leakage current. In this paper, the corner effect of fin-type SONOS flash memory devices is investigate by 3D Process and device simulation and their electrical characteristics are compared to conventional SONOS devices. The corner effect has been observed in fin-type SONOS device. The reason why the memory characteristic in fin-type SONOS flash memory device is not improved, might be due to existing undesirable effect such as corner effect as well as the mutual interference of electric field in the fin-type structure as reported previously.

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A Study on the Corner Effect of Fin-type SONOS Flash Memory Using TCAD Simulation
J Electr Electron Mater. 2012;25(2):100-104.   Published online February 1, 2012
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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A Study on the Corner Effect of Fin-type SONOS Flash Memory Using TCAD Simulation
J Electr Electron Mater. 2012;25(2):100-104.   Published online February 1, 2012
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