Conductive SrMoO3 thin films were fabricated by RF magnetron sputtering with the powder-type sputtering target, and annealed for crystallization. When RTP (rapid thermal processing) in vacuum was applied, the fabricated thin films showed the mixed phases of SrMoO3 and SrMoO4, but SrMoO3 phase could be promoted by the lowering of the working pressure during deposition. In order to eliminate O2 gas during deposition and annealing, further lowering of the working pressure and furnace annealing in hydrogen atmosphere were tried. With the optimization of the deposition and annealing conditions, the thin film with nearly single-phase of SrMoO3 was obtained, and it showed good electrical conduction properties with a low resistivity of 2.5×10(-3)Ω·cm at room temperature.
