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PRAM을 위한 Aux(Ge2Sb2Te5)1-x (x=0, 0.0110, 0.0323, 0.0625) 박막의 상변환 특성

신재호, 백승철, 김병철, 이현용

Phase Change Characteristics of Aux(Ge2Sb2Te5)1-x (x=0, 0.0110, 0.0323, 0.0625) Thin Film for PRAM

Jae Ho Shin, Seung Cheol Baek, Byung Cheul Kim, Hyun Yong Lee
J Electr Electron Mater 2011;24(5):404-409.
Published online: May 1, 2011
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An amorphous Ge2Sb2Te5 thin film is one of the most commonly used materials for phase-change data storage. In this study, Aux(Ge2Sb2Te5)1-x thin film amorphous-to-crystalline phase-change rate were evaluated in using 658 nm laser beam. The focused laser beam with a diameter <10 μm was illuminated in the power (P) and pulse duration (t) ranges of 1-17 mW and 10-460 ns, respectively, with subsequent detection of the responsive signals reflected from the film surface. We also evaluated the material characteristics, such as optical absorption and energy gap, crystalline phases, and sheet resistance of as-deposited and annealed films. The result of experiments showed that the thermal stability of the Ge2Sb2Te5 film is largely improved by adding Au.

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Phase Change Characteristics of Aux(Ge2Sb2Te5)1-x (x=0, 0.0110, 0.0323, 0.0625) Thin Film for PRAM
J Electr Electron Mater. 2011;24(5):404-409.   Published online May 1, 2011
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Phase Change Characteristics of Aux(Ge2Sb2Te5)1-x (x=0, 0.0110, 0.0323, 0.0625) Thin Film for PRAM
J Electr Electron Mater. 2011;24(5):404-409.   Published online May 1, 2011
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