Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

플라즈마 식각에 의하여 실리콘 표면에 유기된 불순물 오염의 분석 및 제거

조선희, 이원종

Analysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface

,
J Electr Electron Mater 2006;19(12):1078-1084.
Published online: December 1, 2006
  • 4 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Analysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface
J Electr Electron Mater. 2006;19(12):1078-1084.   Published online December 1, 2006
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Analysis and Reduction of Impurity Contamination Induced by Plasma Etching on Si Surface
J Electr Electron Mater. 2006;19(12):1078-1084.   Published online December 1, 2006
Close