Study on Etching Damages of YMnO3 Thin Films by Cl-based Plasma

Jae Hwa Park; Kyoung Tae Kim; Dong Pyo Kim; Chang Il Kim; Eui Goo Chang

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Cl-based 플라즈마에 의한 YMnO3 박막의 식각 damage에 관한 연구

박재화, 김경태, 김동표, 김창일, 장의구

Study on Etching Damages of YMnO3 Thin Films by Cl-based Plasma

Jae Hwa Park, Kyoung Tae Kim, Dong Pyo Kim, Chang Il Kim, Eui Goo Chang

J Electr Electron Mater 2003;16(6):449-453.
Published online: June 1, 2003

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Keywords: Ferroelectric, YMnO3, ICP, Damage, Etching

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Study on Etching Damages of YMnO3 Thin Films by Cl-based Plasma

J Electr Electron Mater. 2003;16(6):449-453. Published online June 1, 2003

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Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Study on Etching Damages of YMnO3 Thin Films by Cl-based Plasma

J Electr Electron Mater. 2003;16(6):449-453. Published online June 1, 2003

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Cl-based 플라즈마에 의한 YMnO3 박막의 식각 damage에 관한 연구

Study on Etching Damages of YMnO3 Thin Films by Cl-based Plasma

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