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Ar/CF4 유도결합 플라즈마를 이용한 BET 박막의 식각 메카니즘

임규태, 김경태, 김동표, 김창일

Etching Mechanism of Bi4-xEuxTi3O12 (BET) Thin Films using Ar/CF4 Inductively Coupled Plasma

Kyu Tae Lim, Kyoung Tae Kim, Dong Pyo Kim, Chang Il Kim
J Electr Electron Mater 2003;16(4):298-303.
Published online: April 1, 2003
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Etching Mechanism of Bi4-xEuxTi3O12 (BET) Thin Films using Ar/CF4 Inductively Coupled Plasma
J Electr Electron Mater. 2003;16(4):298-303.   Published online April 1, 2003
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.
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Etching Mechanism of Bi4-xEuxTi3O12 (BET) Thin Films using Ar/CF4 Inductively Coupled Plasma
J Electr Electron Mater. 2003;16(4):298-303.   Published online April 1, 2003
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