Skip to main navigation Skip to main content
  • KIEEME

J Electr Electron Mater : Journal of Electrical and Electronic Materials

OPEN ACCESS
ABOUT
BROWSE ARTICLES
EDITORIAL POLICIES
FOR CONTRIBUTORS

Articles

CF4 / Ar 가스 플라즈마를 이용한 YMnO3 박막의 식각 반응연구

김동표, 김창일, 이철인

Etching Mechanism of YMnO3 Thin Films in High Density CF4 / Ar Plasma

Dong Pyo Kim, Chang Il Kim, Cheol In Lee
J Electr Electron Mater 2001;14(12):959-964.
Published online: December 1, 2001
  • 5 Views
  • 0 Download
  • 0 Crossref
  • 0 Scopus
prev next

Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:

Include:

Etching Mechanism of YMnO3 Thin Films in High Density CF4 / Ar Plasma
J Electr Electron Mater. 2001;14(12):959-964.   Published online December 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

Format:
Include:
Etching Mechanism of YMnO3 Thin Films in High Density CF4 / Ar Plasma
J Electr Electron Mater. 2001;14(12):959-964.   Published online December 1, 2001
Close