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유도 결합 플라즈마를 이용한 CeO2 박막의 식각 메커니즘

오창석, 김창일

The Etching Mechanism of CeO2 Thin Films using Inductively Coupled Plasma

Chang Seok Oh, Chang Il Kim
J Electr Electron Mater 2001;14(9):695-699.
Published online: September 1, 2001
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The Etching Mechanism of CeO2 Thin Films using Inductively Coupled Plasma
J Electr Electron Mater. 2001;14(9):695-699.   Published online September 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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The Etching Mechanism of CeO2 Thin Films using Inductively Coupled Plasma
J Electr Electron Mater. 2001;14(9):695-699.   Published online September 1, 2001
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