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반도체 : 0.12μm 설계 규칙을 갖는 DRAM 셀 주요 레이어의 OPC 및 PSM

박기천, 오용호, 임성우, 고춘수, 이재철

Study the Feasibility of Optical Lithography for Critical Layers of 0.12μm DRAM

Ki Chon Park, Yong Ho Oh, Sung Woo Lim, Chun Soo Go, Jai Cheol Lee
J Electr Electron Mater 2001;14(1):6-11.
Published online: January 1, 2001
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Study the Feasibility of Optical Lithography for Critical Layers of 0.12μm DRAM
J Electr Electron Mater. 2001;14(1):6-11.   Published online January 1, 2001
Download Citation

Download a citation file in RIS format that can be imported by all major citation management software, including EndNote, ProCite, RefWorks, and Reference Manager.

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Study the Feasibility of Optical Lithography for Critical Layers of 0.12μm DRAM
J Electr Electron Mater. 2001;14(1):6-11.   Published online January 1, 2001
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