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"brush"

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"brush"

Fabrication of the Solution-Derived BiAlO Thin Film by Using Brush Coating Process for Liquid Crystal Device
Ju Hwan Lee, Dai-hyun Kim
J Korean Inst Electr Electron Mater Eng 2021;34(5):321-326.   Published online September 1, 2021
DOI: https://doi.org/10.4313/JKEM.2021.34.5.321
We fabricated BiAlO thin film by a solution process with a brush coating to be used as liquid crystal (LC) alignment layer. Solution-processed BiAlO was coated on the glass substrate by brush process. Prepared thin films were annealed at different temperatures of 80℃, 180℃, and 280℃. To verify whether the BiAlO film was formed properly, X-ray photoelectron spectroscopy analysis was performed on Bi and Al. Using a crystal rotation method by polarized optical microscopy, LC alignment state was evaluated. At the annealing temperature of 280℃, the uniform homogenous LC alignment was achieved. To reveal the mechanism of LC alignment by brush coating, field emission scanning electron microscope was used. Through this analysis, spin-coated and brush coated film surface were compared. It was revealed that physical anisotropy was induced by brush coating at a high annealing temperature. Particles were aligned in one direction along which brush coating was made, resulting in a physical anisotropy that affects a uniform LC alignment. Therefore, it was confirmed that brush coating combined with BiAlO thin film annealed at high temperature has a significant potential for LC alignment.
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Effect of PVA Brush Contamination on Post-CMP Cleaning Performance
Han Chul Cho, Min Jong Yuh, Suk Joo Kim, Hae Do Jeong
J Korean Inst Electr Electron Mater Eng 2009;22(2):114-118.   Published online February 1, 2009
DOI: https://doi.org/10.4313/JKEM.2009.22.2.114

Citations

Citations to this article as recorded by  
  • Combined Effects of PVA Brush Scrubbing Parameters and Processes on Post-CMP Cross-Contamination
    Kwang-Min Han, Sumit Kumar, Mir Jalal Khan, Jae-Hyeong Lee, Tae-Gon Kim, Jin-Goo Park
    ECS Journal of Solid State Science and Technology.2025; 14(4): 044013.     CrossRef
  • Particle removal behavior of micropatterned pad buffing in post-CMP cleaning
    Hokyoung Jung, Youngwook Park, Hanchul Cho, Doyeon Kim, Taekyung Lee, Haedo Jeong, Hyoungjae Kim
    Materials Science in Semiconductor Processing.2025; 194: 109530.     CrossRef
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Fabrication and Characterization of Thermal Expanded Core Fiber using the Flame Brushing Method
J Korean Inst Electr Electron Mater Eng 2007;20(12):1077-1081.   Published online December 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.12.1077
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Three Branches Vertical Hall Sensor for Rotation Angle Detection
J Korean Inst Electr Electron Mater Eng 2005;18(9):840-845.   Published online September 1, 2005
DOI: https://doi.org/10.4313/JKEM.2005.18.9.840
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