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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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"VO2"

Etching Characteristics of VO2 Films in Inductively coupled CI2,Ar Plasma
Hee Sung Jung, Sung Ihl Kim, Kwang Ho Kwon
J Electr Electron Mater 2008;21(8):727-732.   Published online August 1, 2008
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