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Tungsten slurry
WHERE t1.sid in(parameter_dbtbl_keyword '%Tungsten slurry%') and t1.xml_status <> 99
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Chemical mechanical polishing (1)
CMP (1)
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Removal rate (1)
SEM (1)
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2004 (1)
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Gwon U Choe (1)
Yeon Og Choe (1)
U Seon Lee (1)
Yeong Sig Lee (1)
Yong Taeg O (1)
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CMP (1)
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"Tungsten slurry"
Effects of Oxidizer Additive on the Performance of Copper-Chemical Mechanical Polishing using Tungsten Slurry
U Seon Lee, Gwon U Choe, Yeong Sig Lee, Yeon Og Choe, Yong Taeg O, Yong Jin Seo
J Electr Electron Mater
2004;17(2):156-161.
Published online February 1, 2004
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