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"Thermal treatment"

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"Thermal treatment"

Effect of pH on the Synthesis of Cu2O Composites Using NaBH4 Reducing Agent and the Influence of Heat Treatment on Properties
Seongmin Shin, Kyunghwan Kim, Jeongsoo Hong
J Electr Electron Mater 2025;38(1):49-53.   Published online January 1, 2025
DOI: https://doi.org/10.4313/JKEM.2025.38.1.6
Cu2O metal oxide was synthesized using NaBH4 as a reducing agent in this study. The transformation of Cu composite with the pH adjustment was investigated, and the conditions for Cu2O synthesis were analyzed. As pH of the solution was changed, the synthesized Cu composite evolved into Cu/Cu2O and Cu/Cu2O/CuO composites. The Cu2O composite synthesized under conditions closest to pure Cu2O was heat-treated at 200℃. The remaining minor Cu metal was oxidized, resulting in pure Cu2O particles with enhanced crystallinity. The synthesized Cu2O exhibited various morphology with particle sizes of about 160~720 nm, and the shape and size of the Cu2O particles remained significantly unchanged after heat treatment. Surface analysis was conducted to compare the changes before and after heat treatment. No significant changes were observed, except for those attributed to water evaporation. The Cu2O synthesized via this simple chemical reduction method can be utilized in various application fields, including catalysts, optical devices, and sensors.
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Study of Low Temperature Solution-Processed Al2O3 Gate Insulator by DUV and Thermal Hybrid Treatment
Hyun Gyu Jang, Won Keun Kim, Min Suk Oh, Soon-hyung Kwon
J Electr Electron Mater 2020;33(4):286-290.   Published online July 1, 2020
DOI: https://doi.org/10.4313/JKEM.2021.33.4.7
The formation of inorganic thin films in low-temperature solution processes is necessary for a wide range of commercial applications of organic electronic devices. Aluminum oxide thin films can be utilized as barrier films that prevent the deterioration of an electronic device due to moisture and oxygen in the air. In addition, they can be used as the gate insulating layers of a thin film transistor. In this study, aluminum oxide thin film were formed using two methods simultaneously, a thermal process and the DUV process, and the properties of the thin films were compared. The result of converting aluminum nitrate hydrate to aluminum oxide through a hybrid process using a thermal treatment and DUV was confirmed by XPS measurements. A film-based a-IGZO TFT was fabricated using the formed inorganic thin film as a gate insulating film to confirm its properties.
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