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SiOxNy
WHERE t1.sid in(parameter_dbtbl_keyword '%SiOxNy%') and t1.xml_status <> 99
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Facing target sputtering (1)
Gas barrier Layer (1)
High deposition rate (1)
SiOx (1)
SiOxNy (1)
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2009 (1)
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Hwa Min Kim (1)
Yong Jin Park (1)
Sun Young Sohn (1)
Jin Woon Son (1)
Keywords
Facing target sputtering (1)
Gas barrier Layer (1)
High deposition rate (1)
SiOx (1)
SiOxNy (1)
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authors
Hwa Min Kim (1)
Yong Jin Park (1)
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Jin Woon Son (1)
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"SiOxNy"
Process Characteristics of SiOx and SiOxNy Films on a Gas Barrier Layer using Facing Target Sputtering (FTS) System
Jin Woon Son, Yong Jin Park, Sun Young Sohn, Hwa Min Kim
J Electr Electron Mater
2009;22(12):1028-1032.
Published online December 1, 2009
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