In this study, Cu(In, 5,Ga)Se2 (CIGS) thin films were prepared on the Mo coated soda-lime glass by the DC magnetron sputtering and a subsequent selenization process. For the selenization process. selenization rapid thermai process(WIP) with cracker cell, which was helpful to smaller an atomic of Se, was adopted. To make GIGS layer, they were then annealed with the cracked Se. Based on this selenization method, we made several GIGS thin film and investigated the effects of In deposition time, and selenization time. Through x-ray diffraction (XRD), scanning electron microscope (SEM), energy dispersive spectroscopy (EDS), and atomic force microscopy (AFM), it is found that the Mo/In/CuGa structure and the high sputtering power shows the dominant chalcopyrite structure and have a uniform distribution of the grain size. The CIGS films with the In deposition time of 5 ruin has the best structure due to the smooth surface. And CIGS films with the selenization time of 50 mm show good crystalline growth without any voids.

Thin light-active layers of the CuInSe2 solar cell were prepared on Mo-coated sodalime glass substrates by one-step electrodeposition and post-annealing. The structure, morphology, and composition of CuInSe2 film could be controlled by deposition parameters, such as the composition of metallic precursors, the concentration of complexing agents, and the temperature of post-annealing with elemental selenium. A dense and uniform Cu-poor CuInSe2 film was successfully obtained in a range of parametric variation of electrodeposition with a constant voltage of -0.5 V vs. a Ag/AgCl reference electrode. The post-annealing of the film at high temperature above 500℃ induced crystallization of CuInSe2 with well-developed grains. The KCN-treatment of the annealed CuInSe2 films further induced Cu-poor CuInSe2 films without secondary phases, such as Cu2Se. The structure, morphology, and composition of CuInSe2 films were compared with respect to the conditions of electrodeposition and post-annealing using SEM, XRD, Raman, AES and EDS analysis. And the conditions for preparing device-quality CuInSe2 films by electrodeposition were proposed.