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"RF magnetron sputtering deposition"

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"RF magnetron sputtering deposition"

Effect of Structure Change in Second-Generation Superconducting Wire Stabilization Layer on Resistivity Characteristics
Sang-jae Ban, Ho-ik Du, Hyun-gi Jeong, Seung-gyu Doo, Sung-chae Yang
J Electr Electron Mater 2022;35(2):172-177.   Published online March 1, 2022
DOI: https://doi.org/10.4313/JKEM.2022.35.2.10
The quench voltage of the second-generation superconducting wire is affected by the resistivity characteristics of the stabilization layer. The specific resistance of the stabilization layer can be changed by the deposition process using RF magnetron sputtering. In this paper, a thin film made of a homogeneous material (Ag) and a dissimilar material (Cu) was deposited on the stabilization layer of the second-generation superconducting wire through RF magnetron sputtering. We found that the specific resistance was reduced by increasing the thickness of the stabilization layer. The reduction in the resistivity of the stabilization layer led to a decrease in the quench voltage of the second-generation superconducting wire. We suggest that various characteristic changes of the second-generation superconducting wire can be expected through the successful change in the resistivity of the stabilization layer of the proposed deposition process.
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