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Polishing Pad
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"Polishing Pad"
Application of Herd Porous Pad in Metal CMP Process
Sang Yong Kim, Nam Hoon Kim, In Pyo Kim, Eui Goo Chang
J Korean Inst Electr Electron Mater Eng
2003;16(5):385-389.
Published online May 1, 2003
DOI:
https://doi.org/10.4313/JKEM.2003.16.5.385
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