An excellent hydrophobic surface has a high contact angle over 147 degree and the contact anglehysteresis below 50 was produced by using roughness combined with hydrophobic PTFE coatings, which were alsoconfirmed to exhibit an extreme adhesion to glass substrate. To form the rough surface, the glass was etched byAr-plasma. A very thin PTFE film was coated on the plasma etched glass surface. Roughness factors before orafter PTFE coating on the plasma etched glass surface, based on Wensel``s model were calculated, which agreeswell with the dependence of the contact angle on the roughness factor is predicted by Wensel``s model. The PTFEfilms deposited on glass by using a conventional rf-magnetron sputtering. The glass substrates were etchedAr-plasma prior to the deposition of PTFE. Their hydrophobicities are investigated for application as a anti-foulingcoating layer on the screen of displays. It is found that the hydrophobicity of PTFE films mainly depends on thesputtering conditions, such as rf-power, Ar gas content introduced during deposition. These conditions are closelyrelated to the deposition rate or thickness of PTFE film. Thus, it is also found that the deposition rate or the filmthickness affects sensitively the geometrical morphology formed on surface of the rf-sputtered PTFE films. Inparticular, 1,950-nm-thick PTFE films deposited for 30 minute by rf-power 50 watt under Ar gas content of 20sccm shows a very excellent optical transmittance and a good anti-fouling property and a good durability.

PTFE composites for use of microwave substrate were fabricated by impregnation and heat treatment fabrication with glass fabric. This study shows dielectric properties such as dielectric constant and loss can be controlled by thickness of PTFE composite with of pressure condition in heating press process. The dielectric constant of the PTFE composites has decreasing tendency as given higher pressure condition. The dielectric loss has similar result too. Especially, the case of the dielectric loss was affected by the condition of pressure at heating press and had the best performance under 3 MPa. In order to see the reason why thickness conditions make different, their microstructures were also observed.

Super-hydrophobic properties have been achieved on the rf-sputtered polytetrafluoroethylene(PTFE) films deposited on etched aluminum surfaces. The microstructural evolution created after etching has been investigated by FESEM. The water contact angle over 160o can be achieved on the rf-sputtered ultra-tihn PTFE film less than 10 nm coated on aluminum surface etched with 7 wt.%, 12.5 wt.%, and 15 wt.% HCl concentration for 12 min. XPS analysis have revealed the presence of a large quantity of -CF3 and -CF2 groups in the rf-sputtered PTFE films that effectively can reduce the surface energy of etched aluminum. The presence of patterned morphology along with the low surface energy at the rf-sputtered PTFE coating makes the aluminum surface with high super-hydrophobic property.