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"MIM structure"

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"MIM structure"

A Study on the Electrical Properties of MIM Structures Based on Ge2Sb2Te5 and Ge8Sb2Te11 Thin Films for ReRAM
Hwi-jong Jang, Heon Kong, Jong-bin Yeo, Hyun-yong Lee
J Electr Electron Mater 2017;30(3):144-147.   Published online March 1, 2017
In this study, Ge2Sb2Te5 and Ge8Sb2Te11 were used as an insulator layer to fabricate ReRAM devices. The resistance change is correlated to the appearance or disappearance of a conductivity filament at the surface of the GeSbTe layer. Changes in the electrical properties of ITO/GeSbTe/Ag devices were measured using a I-V-L measurement system. As a result, compared to the ITO/Ge8Sb2Te11/Ag device, this ITO/Ge2Sb2Te5/Ag ReRAM device exhibits highly uniform bipolar resistive switching characteristics, such as the operating voltages, and the resistance values.
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A Study on Physical Properties of Carbon Nitride Films and Application for Sensor Materials
J Electr Electron Mater 2007;20(5):436-442.   Published online May 1, 2007
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