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"MIM structure"

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"MIM structure"

A Study on the Electrical Properties of MIM Structures Based on Ge2Sb2Te5 and Ge8Sb2Te11 Thin Films for ReRAM
Hwi-jong Jang, Heon Kong, Jong-bin Yeo, Hyun-yong Lee
J Korean Inst Electr Electron Mater Eng 2017;30(3):144-147.   Published online March 1, 2017
DOI: https://doi.org/10.4313/JKEM.2017.30.3.144
In this study, Ge2Sb2Te5 and Ge8Sb2Te11 were used as an insulator layer to fabricate ReRAM devices. The resistance change is correlated to the appearance or disappearance of a conductivity filament at the surface of the GeSbTe layer. Changes in the electrical properties of ITO/GeSbTe/Ag devices were measured using a I-V-L measurement system. As a result, compared to the ITO/Ge8Sb2Te11/Ag device, this ITO/Ge2Sb2Te5/Ag ReRAM device exhibits highly uniform bipolar resistive switching characteristics, such as the operating voltages, and the resistance values.
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A Study on Physical Properties of Carbon Nitride Films and Application for Sensor Materials
J Korean Inst Electr Electron Mater Eng 2007;20(5):436-442.   Published online May 1, 2007
DOI: https://doi.org/10.4313/JKEM.2007.20.5.436
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