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"Low deposition temperature"

Characteristics of SiOx Gas Barrier Films as a Function of Process Conditions in Facing Target Sputtering (FTS) System
Kang Bae, Tae Hyun Wang, Sun Young Sohn, Hwa Min Kim, Jae Suk Hong
J Electr Electron Mater 2009;22(7):595-601.   Published online July 1, 2009
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