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"Laser etching"

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"Laser etching"

Laser Etching Characteristics of ITO/Ag/ITO Conductive Films on Forward/Reverse Sides of Flexible Substrates
Hanyeob Nam, Sang Jik Kwon, Eou-sik Cho
J Electr Electron Mater 2016;29(11):707-711.   Published online November 1, 2016
ITO/Ag/ITO conductive films on PET (polyethylene terephthalate) was etched by a Q-switched diode-pumped neodymiun-doped yttrium vanadate (Nd:YVO4, λ = 1064 ㎚) laser. During the laser direct etching, the laser beam was incident on the two different directions of PET and the etching patterns were investigated and analyzed. At a lower repetition rate of laser pulse, the larger laser etched patterns were obtained by laser beam incident on reverse side of PET substrate. On the contrary, at a higher repetition rate, it was possible to find the larger etched patterns in case of the laser beam incidence on forward side of PET substrate. For the laser beam incidence on reverse side, the laser beam is expected to be transferred and scattered through the PET substrate and the laser beam energy is thought to be dependent on the etch laser pulse beam energy.
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A Study on Indirect-Direct Bandgap Structures of 2D-layered Transition Metal Dichalcogenides by Laser Etching
Eun-a Moon, Pil-ju Ko
J Electr Electron Mater 2016;29(9):576-580.   Published online September 1, 2016
Single-layered transition metal dichalcogenides (TMDs) exhibit more interesting physical properties than those of bulk TMDs owing to the indirect to direct bandgap transition occurring due to quantum confinement. In this research, we demonstrate that layer-by-layer laser etching of molybdenum diselenide (MoSe2) flakes could be controlled by varying the parameters employed in laser irradiation (time, intensity, interval, etc.). We observed a dramatic increase in the photoluminescence (PL) intensity (1.54 eV peak) after etching the samples, indicating that the removal of several layers of (MoSe2) led to a change from indirect to direct bandgap. The laser-etched (MoSe2) exhibited the single (MoSe2) Raman vibration modes at ~239.4 cm-1 and ~295 cm-1, associated to out-of-plane A1g and in-plane E1 2g Raman modes, respectively. These results indicate that controlling the number of MoSe2 layers by laser etching method could be employed for optimizing the performance of nano-electronic devices.
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