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"Inorganic film"

Properties Characterization of the Hydrophilic Inorganic Film as Function of Coating Thickness
Yeun Ho Joung, Won Seok Choi, Yong Tak Shin, Min Ji Lee, Hee Kon Kim
J Electr Electron Mater 2013;26(6):425-428.   Published online June 1, 2013
In this paper, we present a novel hydrophilic coating material (Wellture Finetech, Korea) which can be utilized as a coating layer for anti-contamination for electrical and electronic system. The coating material was deposited on 4 inch silicon wafer with several different film thickness. The film thickness was controlled by spin coating speed. After curing of the film, we have scratched by permanent marker to check self-cleaning property of the film. Also we have executed several mechanical tests of the films. As the spin coating speed is increased, the film thickness was thickness was thinned from 230 nm to 125nm. Contact angle of the film lowered from 30° to 12° as the spin coating speed is increased from 700 to 2,500rpm. On permanent marker scratched film surface coated at 1,000 rpm. We have poured regular city water to investigate self cleaning property of the film. The scratches were gradually separated from the film surface due to super-hydrophilicity of the film. Hardness of coated film was 9H measured by ASTM D3363 method. And adhesion of all film was 5B tested by D3359 method. Also, to get exact hardness value of the film, we have utilized a nano-indenter. As spin speed is increased, the hardness of film was increased from 3 Gpa to 5 Gpa.
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