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"High refractive index"

Fabrication of High Refractive Index ZrO2 Thin Film by a Layer-by-layer Self-assembly Method
Chang-sik Choi, Ji-sun Lee, Mi-jai Lee, Young-jin Lee, Dae-woo Jeon, Byoung-jo Ahn, Jin-ho Kim
J Electr Electron Mater 2017;30(4):199-203.   Published online April 1, 2017
ZrO2/PSS thin film with a high refractive index was fabricated on a glass substrate by a layer-by-layer self-assembly method. The surface morphology and thickness of the fabricated ZrO2/PSS thin films were measured as a function of the number of (ZrO2/PSS)n. As the number of (ZrO2/PSS)n increased from n = 5 to n = 20, RMS roughness decreased from 29.01 nm to 8.368 nm. The ZrO2 thin films exhibited high transmittance of 85% or more; and the 15-bilayer thin film exhibited the highest transmittance among the samples. The transmittance of the fabricated (ZrO2/PSS)15 thin film was ca. 90.8% in the visible range. The refractive index of the glass substrate coated by a (ZrO2/PSS)15 thin film with a thickness of 160 nm increased from ca. 1.52 to 1.74 at the 632 nm wavelength.
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