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High deposition rate
WHERE t1.sid in(parameter_dbtbl_keyword '%High deposition rate%') and t1.xml_status <> 99
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"High deposition rate"
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Facing target sputtering (2)
High deposition rate (2)
Gas barrier Layer (1)
Low deposition temperature (1)
Permanent magnet array (1)
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Publication year
2009 (2)
Authors
Hwa Min Kim (2)
Sun Young Sohn (2)
Kang Bae (1)
Jae Suk Hong (1)
Yong Jin Park (1)
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Keywords
Facing target sputtering (2)
High deposition rate (2)
Gas barrier Layer (1)
Low deposition temperature (1)
Permanent magnet array (1)
Silicon oxide (1)
SiOx (1)
SiOxNy (1)
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authors
Hwa Min Kim (2)
Sun Young Sohn (2)
Kang Bae (1)
Jae Suk Hong (1)
Yong Jin Park (1)
Jin Woon Son (1)
Tae Hyun Wang (1)
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"High deposition rate"
Process Characteristics of SiOx and SiOxNy Films on a Gas Barrier Layer using Facing Target Sputtering (FTS) System
Jin Woon Son, Yong Jin Park, Sun Young Sohn, Hwa Min Kim
J Korean Inst Electr Electron Mater Eng
2009;22(12):1028-1032.
Published online December 1, 2009
DOI:
https://doi.org/10.4313/JKEM.2009.22.12.1028
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Characteristics of SiOx Gas Barrier Films as a Function of Process Conditions in Facing Target Sputtering (FTS) System
Kang Bae, Tae Hyun Wang, Sun Young Sohn, Hwa Min Kim, Jae Suk Hong
J Korean Inst Electr Electron Mater Eng
2009;22(7):595-601.
Published online July 1, 2009
DOI:
https://doi.org/10.4313/JKEM.2009.22.7.595
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