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J Electr Electron Mater : Journal of Electrical and Electronic Materials

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"Etching resist ink"

A Printing Process Combining Screen Printing with Reverse Off-set for a Fine Patterning of Electrodes on Large Area Substrate
Ji Eun Park, Chung Kun Song
J Electr Electron Mater 2011;24(5):374-380.   Published online May 1, 2011
In this paper a printing process for patterning electrodes on large area substrate was developed by combining screen printing with reverse off-set printing. Ag ink was uniformly coated by screen printing. And then etching resist (ER) was patterned in the Ag film by reverse off-set printing, and then the non-desired Ag film was etched off by etchant. Finally, the ER was stripped-off to obtain the final Ag patterns. We extracted the suitable conditions of reverse Using the process we successfully fabricated gate electrodes and scan bus lines of OTFT-backplane used for e-paper, in which the diagonal size was 6 inch, the resolution 320x240, the minimum line width 30 um, and sheet resistance 1 Ω/□.
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